Evaluation of the Component of the Systematic Error in X-Ray Microanalysis Attributed to the Surface Relief of the Sample
Abstract
A semi-empirical method of a priori estimates of the effect of surface relief on the results of binary compounds electron probe microanalysis is developed. The dimensionless parameter k which characterizes the effect of the surface relief on the intensity of characteristic x-ray is determined using experimental data obtained for test single-crystal GaAs samples with known geometrical parameters of the relief.
About the Authors
A. L. Vasil’Ev
Национальный исследовательский центр «Курчатовский институт»
Russian Federation
Russian Federation
V. B. Mityukhlyaev
Научно-исследовательский центр по изучению свойств поверхности и вакуума
Russian Federation
Russian Federation
A. A. Mikhutkin
Национальный исследовательский центр «Курчатовский институт»
Russian Federation
Russian Federation
P. A. Todua
Научно-исследовательский центр по изучению свойств поверхности и вакуума; Московский физико-технический институт
Russian Federation
Russian Federation
M. N. Filippov
Научно-исследовательский центр по изучению свойств поверхности и вакуума; Московский физико-технический институт; Институт общей и неорганической химии им. Н. С. Курнакова РАН
Russian Federation
Russian Federation
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Review
For citations:
Vasil’Ev A.L., Mityukhlyaev V.B., Mikhutkin A.A., Todua P.A., Filippov M.N. Evaluation of the Component of the Systematic Error in X-Ray Microanalysis Attributed to the Surface Relief of the Sample. Industrial laboratory. Diagnostics of materials. 2016;82(12):15-18. (In Russ.)
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